| Vacuum Chamber | LL Room: SUS304, W500 mm×D800 mm×H2890 mm PR Room: SUS304, φ1650 mm × H1200 mm |
| Substrate Holder | Selectable 13 - 22 pcs a holder |
| Rotary substrate drum system | ψ1500 mm, Drum Type, 10 rpm - 100 rpm (Variable) |
| Reaction source | ICP (Inductively coupled plasma) |
| Sputtering source | Dual rotary cathode (Planner type as option) |
| Evacuation system | Roughing pump, Turbo molecular pump |
| Performance | |
| Ultimate Pressure | LL chamber: 10 Pa PR chamber: ≤5.0 × 10-4 Pa |
| Pump Down Rate | LL chamber: ≤20 min (from atmospheric to 1.0 × 10-1 Pa) PR chamber: ≤40 min (from atmospheric to 5.0 × 10-3 Pa) |
| Setting substrate heating temperature |
150℃ as option |
| Utility Requirements | |
| Layout Dimensions | 5800 mm (W) × 7700 mm (D) × 3200 mm (H) |
| Power Requirements | 3-phase, 380V ± 10％、130kVA、50/60Hz |
| Cooling Water Flow Rate | 180lmin or greater |
| Compressed Air Pressure | 0.5 MPa - 0.7 MPa |
| Gross Weight | 16000 kg approx. |
