| Chamber Size | SUS304, ψ1300mm × 1500mm (H) |
| Substrate Dome | Four-sectional Dome (or ψ1200mm) |
| Max. Dome Rotation Speed | 30 rpm (Variable) |
| Crystal Film Thickness Monitor | XTC/3 plus 6-point rotary sensor |
| Evaporation Source | One unit of EB source |
| PERFORMANCE | |
| Ultimate Pressure | 7.0 × 10-5 Pa or lower |
| Pumping Speed | 10 min (from atmospheric pressure to 3.0 × 10-3 Pa) |
| Max. Substrate Heating Temp. | 350 ゜C |
| UTILITY REQUIREMENTS | |
| Installation Space | 4500mm (W) × 6000mm (D) × 3200mm (H) |
| Power Source | 3-phase, 200V, 50/60Hz, 80kVA, approx. |
| Minimum Water Flow | 100lmin |
| Air Pressure | 0.5 - 0.7 MPa |
| Weight | 6500kg, approx. |
| Chamber Size | ψ2350mm × H1400mm |
| Substrate Dome | ψ2200mm, Five-sectional |
| Max. Dome Rotation Speed | 20rpm |
| Crystal Film Thickness Monitor | 6-point Crystal flim monitor |
| Evaporation Source | One unit of EB source, Movable AS source |
| Ion Source | RF Ion Source |
| PERFORMANCE | |
| Ultimate Pressure | 7.0E-5 Pa or lower |
| Pumping Speed | 15 min (from atmospheric pressure to 2.0 × 10-3 Pa） |
| UTILITY REQUIREMENTS | |
| Installation Space | 6300 (W) × 9000 (D) × 4000mm (H) |
| Power Source | 3-phase, 200V, 50/60Hz, 80kVA, approx. |
| Minimum Water Flow | 220lmin |
| Air Pressure | 0.5 - 0.7 MPa |
| Weight | 12000kg, approx. |
